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2014-07-17Zeitschriftenartikel DOI: 10.1364/OE.22.017948
Characterization of semiconductor materials using synchrotron radiation-based near-field infrared microscopy and nano-FTIR spectroscopy
dc.contributor.authorHermann, Peter
dc.contributor.authorHoehl, Arne
dc.contributor.authorUlrich, Georg
dc.contributor.authorFleischmann, Claudia
dc.contributor.authorHermelink, Antje
dc.contributor.authorKästner, Bernd
dc.contributor.authorPatoka, Piotr
dc.contributor.authorHornemann, Andrea
dc.contributor.authorBeckhoff, Burkhard
dc.contributor.authorRühl, Eckart
dc.contributor.authorUlm, Gerhard
dc.date.accessioned2018-05-07T18:04:38Z
dc.date.available2018-05-07T18:04:38Z
dc.date.created2015-01-26
dc.date.issued2014-07-17none
dc.identifier.otherhttp://edoc.rki.de/oa/articles/regIZQ4sAvdnQ/PDF/25QFhSZ62niE.pdf
dc.identifier.urihttp://edoc.rki.de/176904/2008
dc.description.abstractWe describe the application of scattering-type near-field optical microscopy to characterize various semiconducting materials using the electron storage ring Metrology Light Source (MLS) as a broadband synchrotron radiation source. For verifying high-resolution imaging and nano-FTIR spectroscopy we performed scans across nanoscale Si-based surface structures. The obtained results demonstrate that a spatial resolution below 40 nm can be achieved, despite the use of a radiation source with an extremely broad emission spectrum. This approach allows not only for the collection of optical information but also enables the acquisition of near-field spectral data in the mid-infrared range. The high sensitivity for spectroscopic material discrimination using synchrotron radiation is presented by recording near-field spectra from thin films composed of different materials used in semiconductor technology, such as SiO2, SiC, SixNy, and TiO2.eng
dc.language.isoeng
dc.publisherRobert Koch-Institut, Biologische Sicherheit
dc.subject.ddc610 Medizin
dc.titleCharacterization of semiconductor materials using synchrotron radiation-based near-field infrared microscopy and nano-FTIR spectroscopy
dc.typeperiodicalPart
dc.identifier.urnurn:nbn:de:0257-10038554
dc.identifier.doi10.1364/OE.22.017948
dc.identifier.doihttp://dx.doi.org/10.25646/1933
local.edoc.container-titleOptics Express
local.edoc.container-textThis paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/oe/abstract.cfm?uri=oe-22-15-17948. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.
local.edoc.fp-subtypeArtikel
local.edoc.type-nameZeitschriftenartikel
local.edoc.container-typeperiodical
local.edoc.container-type-nameZeitschrift
local.edoc.container-urlhttp://www.opticsinfobase.org/oe/
local.edoc.container-publisher-nameOptical Society of America
local.edoc.container-volume22
local.edoc.container-issue15
local.edoc.container-year2014

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